Pregled bibliografske jedinice broj: 166381
Ellipsometric and XPS analysis of the interface between silver and SiO2, TiO2 and SiNx thin films
Ellipsometric and XPS analysis of the interface between silver and SiO2, TiO2 and SiNx thin films // Thin solid films, 455-456 (2004), 468-472 (međunarodna recenzija, članak, znanstveni)
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Naslov
Ellipsometric and XPS analysis of the interface between silver and SiO2, TiO2 and SiNx thin films
Autori
Masetti, Enrico ; Bulir, Jiri ; Gagliardi, Serena ; Janicki, Vesna ; Krasilnikova, Anna ; Di Santo, G. ; Coluzza, C.
Izvornik
Thin solid films (0040-6090) 455-456
(2004);
468-472
Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni
Ključne riječi
Ellipsometry; XPS; Silver; Interfaces
Sažetak
The chemical reactions and diffusion processes at the interface of a metal with oxides and nitrides are a critical issue in the production of metal-dielectric optical filters. The optical properties of these filters depend on the quality of the interfaces between the metal layer and the adjacent dielectric layers. The chemical and physical processes occurring at the silver-dielectric interface are studied by means of ellipsometry and XPS analysis and comprise the subject of the present work.
Izvorni jezik
Engleski
Znanstvena područja
Fizika
POVEZANOST RADA
Citiraj ovu publikaciju:
Časopis indeksira:
- Current Contents Connect (CCC)
- Web of Science Core Collection (WoSCC)
- Science Citation Index Expanded (SCI-EXP)
- SCI-EXP, SSCI i/ili A&HCI
- Scopus
