Pregled bibliografske jedinice broj: 156942
Dust Particle Formation in low pressure Ar/CH4 and Ar/C2H2 discharges used for thin-film deposition
Dust Particle Formation in low pressure Ar/CH4 and Ar/C2H2 discharges used for thin-film deposition // Vacuum, 71 (2003), 3; 377-390 (međunarodna recenzija, članak, znanstveni)
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Naslov
Dust Particle Formation in low pressure Ar/CH4 and Ar/C2H2 discharges used for thin-film deposition
Autori
Berndt, Johannes ; Hong, Suk-Ho ; Kovačević, Eva ; Stefanović, Ilija ; Winter, Joerg
Izvornik
Vacuum (0042-207X) 71
(2003), 3;
377-390
Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni
Ključne riječi
polymerization; plasma; dust; thin films; precursors; chemistry; discharge confinement
Sažetak
Compared are characterteristics of the dust growth in acetylene and methan / argon plasmas uaully used for the thin film deposition (a-C:H materials). Possible precusors for the grwoth process are analyzed, void formation observed.
Izvorni jezik
Engleski
Znanstvena područja
Fizika
POVEZANOST RADA
Projekti:
0036019
Ustanove:
Fakultet elektrotehnike i računarstva, Zagreb
Profili:
Eva Kovačević
(autor)
Citiraj ovu publikaciju:
Časopis indeksira:
- Current Contents Connect (CCC)
- Web of Science Core Collection (WoSCC)
- Science Citation Index Expanded (SCI-EXP)
- SCI-EXP, SSCI i/ili A&HCI
- Scopus
