Pregled bibliografske jedinice broj: 1458
Infrared study of Si-rich silicon oxide films deposited by plasma-enhanced chemical vapor deposition
Infrared study of Si-rich silicon oxide films deposited by plasma-enhanced chemical vapor deposition // Journal of vacuum science and technology A, 15 (1997), 377-389 (međunarodna recenzija, članak, znanstveni)
CROSBI ID: 1458 Za ispravke kontaktirajte CROSBI podršku putem web obrasca
Naslov
Infrared study of Si-rich silicon oxide films deposited by plasma-enhanced chemical vapor deposition
Autori
Sassella, Adele ; Borghesi Alessandro ; Corni, F. ; Monelli, A. ; Ottaviani, G. ; Tonini, R ; Pivac, Branko ; Baccetta, M. ; Zanotti, L.
Izvornik
Journal of vacuum science and technology A (0734-2101) 15
(1997);
377-389
Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni
Ključne riječi
thin films; silicon oxide; infrared; defcts; PECVD
Sažetak
Infrared study of Si-rich silicon oxide films deposited by plasma-enhanced chemical vapor deposition
Izvorni jezik
Engleski
Znanstvena područja
Fizika
POVEZANOST RADA
Citiraj ovu publikaciju:
Časopis indeksira:
- Current Contents Connect (CCC)
- Web of Science Core Collection (WoSCC)
- Science Citation Index Expanded (SCI-EXP)
- SCI-EXP, SSCI i/ili A&HCI
- Scopus
