Naslov
Tungsten-carbon films prepared by reactive sputtering from argon-benzene discharges

Autori
Radić, Nikola ; Gržeta, Biserka ; Milat, Ognjen ; Ivkov, Jovica ; Stubičar, Mirko

Izvornik
Thin solid films (0040-6090) 320 (1998), 2; 192-197

Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni

Ključne riječi
tungsten-carbon films; reactive sputtering technique; argon-benzene discharge; XRD patterns; stability of films; microhardness characterization

Sažetak
Tungsten-carbon thin films have been deposited by reactive (Ar+C6H6) DC magnetron sputtering onto various substrates. Deposition onto glass, monocrystalline silicon, tantalum and stainless steel at room temperature yielded W-C films, having XRD patterns corresponding to the structure of heavily disordered W2C or WC(1-x) carbides. The samples deposited upon the Au or Cu folis were nanocrystalline cubic WC(1-x) with the grain size of 2.9 nm. Disordered tungsten-carbon films were stable up to 1200 oC. Microhardness of the films with disordered W2C phase was about 5-6 GPa while that of the films disordered WC(1-x) phase was about 17 GPa. The characteristics of films can be understood considering the effects of the incorporation of free carbon and/or carbon-hydrogen fragments into the tungsten carbide layer.

Izvorni jezik
Engleski

Znanstvena područja
Fizika, Kemija

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