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Pregled bibliografske jedinice broj: 124547

Al-W amorphous thin films


Radić, Nikola; Car, Tihomir; Tonejc, Antun; Ivkov, Jovica; Stubičar, Mirko; Metikoš-Huković, Mirjana
Al-W amorphous thin films // Physics and Technology of Thin Films / Moshfegh, A.Z. ; Kaenel, H.V. ; Kashyap, S.C. ; Wuittig, M. (ur.).
Singapur: World Scientific Publishing, 2004. str. 101-118 (predavanje, međunarodna recenzija, cjeloviti rad (in extenso), znanstveni)


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Naslov
Al-W amorphous thin films

Autori
Radić, Nikola ; Car, Tihomir ; Tonejc, Antun ; Ivkov, Jovica ; Stubičar, Mirko ; Metikoš-Huković, Mirjana

Vrsta, podvrsta i kategorija rada
Radovi u zbornicima skupova, cjeloviti rad (in extenso), znanstveni

Izvornik
Physics and Technology of Thin Films / Moshfegh, A.Z. ; Kaenel, H.V. ; Kashyap, S.C. ; Wuittig, M. - Singapur : World Scientific Publishing, 2004, 101-118

Skup
International Workshop on Physics and Technology of Thin Films

Mjesto i datum
Teheran, Iran, 22.02.2003. - 06.03.2003

Vrsta sudjelovanja
Predavanje

Vrsta recenzije
Međunarodna recenzija

Ključne riječi
amorphous alloys; aluminum; tungsten; magnetron sputtering; thermal stability; microhardness; corrosion

Sažetak
Completely amorphous Al-W thin films were prepared by magnetron codeposition in the Al82W18 - Al63W37 composition range. Thermal stability of the amorphous films was investigated by the continuous in situ electric resistance measurements up to 720°C, and a prolonged annealing in vacuum at high subcrystallization temperatures. The change in film structure caused by isochronal and isothermal heat treatments was determined by the XRD method. The crystallization temperatures were determined within a whole compositional range of amorphicity. A pronounced structural relaxation of the Al-W amorphous films was attributed to specific electronic structure of aluminum. Mechanical properties of the Al-W thin films improved, while corrosive properties only slightly degraded upon crystallization of the amorphous Al-W thin films in very aggressive environments and in the presence of aggressive Cl- anions.

Izvorni jezik
Engleski

Znanstvena područja
Fizika, Kemija



POVEZANOST RADA


Ustanove:
Institut za fiziku, Zagreb,
Institut "Ruđer Bošković", Zagreb,
Prirodoslovno-matematički fakultet, Zagreb,
Fakultet kemijskog inženjerstva i tehnologije, Zagreb


Citiraj ovu publikaciju:

Radić, Nikola; Car, Tihomir; Tonejc, Antun; Ivkov, Jovica; Stubičar, Mirko; Metikoš-Huković, Mirjana
Al-W amorphous thin films // Physics and Technology of Thin Films / Moshfegh, A.Z. ; Kaenel, H.V. ; Kashyap, S.C. ; Wuittig, M. (ur.).
Singapur: World Scientific Publishing, 2004. str. 101-118 (predavanje, međunarodna recenzija, cjeloviti rad (in extenso), znanstveni)
Radić, N., Car, T., Tonejc, A., Ivkov, J., Stubičar, M. & Metikoš-Huković, M. (2004) Al-W amorphous thin films. U: Moshfegh, A., Kaenel, H., Kashyap, S. & Wuittig, M. (ur.)Physics and Technology of Thin Films.
@article{article, author = {Radi\'{c}, Nikola and Car, Tihomir and Tonejc, Antun and Ivkov, Jovica and Stubi\v{c}ar, Mirko and Metiko\v{s}-Hukovi\'{c}, Mirjana}, year = {2004}, pages = {101-118}, keywords = {amorphous alloys, aluminum, tungsten, magnetron sputtering, thermal stability, microhardness, corrosion}, title = {Al-W amorphous thin films}, keyword = {amorphous alloys, aluminum, tungsten, magnetron sputtering, thermal stability, microhardness, corrosion}, publisher = {World Scientific Publishing}, publisherplace = {Teheran, Iran} }
@article{article, author = {Radi\'{c}, Nikola and Car, Tihomir and Tonejc, Antun and Ivkov, Jovica and Stubi\v{c}ar, Mirko and Metiko\v{s}-Hukovi\'{c}, Mirjana}, year = {2004}, pages = {101-118}, keywords = {amorphous alloys, aluminum, tungsten, magnetron sputtering, thermal stability, microhardness, corrosion}, title = {Al-W amorphous thin films}, keyword = {amorphous alloys, aluminum, tungsten, magnetron sputtering, thermal stability, microhardness, corrosion}, publisher = {World Scientific Publishing}, publisherplace = {Teheran, Iran} }




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