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Pregled bibliografske jedinice broj: 1197862

Photocatalytic Activity of Thin ALD / PE-ALD ZnO Films: a Comparative Study


Daria Jardas; Robert Peter; Mateja Podlogar; Ales Omerzu; Kresimir Salamon; Mladen Petravic
Photocatalytic Activity of Thin ALD / PE-ALD ZnO Films: a Comparative Study // 2020 EFCATS Summer School / Pintar, Albin ; Novak Tušar, Nataša ; Rupprechter, GÜnther (ur.).
Ljubljana: Slovenian Chemical Society, 2020. str. 50-50 (poster, međunarodna recenzija, sažetak, znanstveni)


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Naslov
Photocatalytic Activity of Thin ALD / PE-ALD ZnO Films: a Comparative Study

Autori
Daria Jardas ; Robert Peter ; Mateja Podlogar ; Ales Omerzu ; Kresimir Salamon ; Mladen Petravic

Vrsta, podvrsta i kategorija rada
Sažeci sa skupova, sažetak, znanstveni

ISBN
978-961-93849-8-5

Skup
2020 EFCATS Summer School

Mjesto i datum
Portorož, Slovenija, 15.09.2020. - 19.09.2020

Vrsta sudjelovanja
Poster

Vrsta recenzije
Međunarodna recenzija

Ključne riječi
zinc oxide, thin film, atomic layer deposition, plasma, photocatalysis

Sažetak
The synthesis of thin ZnO films using atomic layer deposition (ALD) technique has many advantages over other techniques such as good repeatability, accurate thickness control and great uniformity of the films [1]. The range of the ALD deposition temperatures for ZnO is from 60 °C to 250 °C and it has a huge impact on the photocatalytic activity of the films. For ZnO films deposited by a conventional thermal ALD, it is known that the final photocatalytic activity of the films greatly improves by increasing the temperature of the substrate during the deposition [1, 2]. A less common plasma-enhanced atomic layer deposition (PE-ALD) is usually employed for the deposition of oxide films at lower temperatures. In the present study, we have examined the influence of the deposition temperature on the photocatalytic activity of the ZnO films deposited by the PE-ALD method. In contrast to ZnO films obtained by the thermal ALD, the photocatalytic activity of the films deposited by the PE-ALD method shows a maximum value for films deposited at 80 °C. For higher deposition temperatures the photocatalytic activity gradually decreases. In the comparative study, we have also characterized structural and physical properties of the thermal ALD and the PE- ALD films with scanning electron microscopy (SEM), UV-Vis absorption spectroscopy, x-ray diffraction (XRD) and x-ray photoelectron spectroscopy (XPS).

Izvorni jezik
Engleski

Znanstvena područja
Fizika, Interdisciplinarne prirodne znanosti



POVEZANOST RADA


Profili:

Avatar Url Daria Jardas (autor)

Avatar Url Aleš Omerzu (autor)

Avatar Url Mladen Petravić (autor)

Avatar Url Krešimir Salamon (autor)

Avatar Url Robert Peter (autor)


Citiraj ovu publikaciju:

Daria Jardas; Robert Peter; Mateja Podlogar; Ales Omerzu; Kresimir Salamon; Mladen Petravic
Photocatalytic Activity of Thin ALD / PE-ALD ZnO Films: a Comparative Study // 2020 EFCATS Summer School / Pintar, Albin ; Novak Tušar, Nataša ; Rupprechter, GÜnther (ur.).
Ljubljana: Slovenian Chemical Society, 2020. str. 50-50 (poster, međunarodna recenzija, sažetak, znanstveni)
Daria Jardas, Robert Peter, Mateja Podlogar, Ales Omerzu, Kresimir Salamon & Mladen Petravic (2020) Photocatalytic Activity of Thin ALD / PE-ALD ZnO Films: a Comparative Study. U: Pintar, A., Novak Tušar, N. & Rupprechter, G. (ur.)2020 EFCATS Summer School.
@article{article, year = {2020}, pages = {50-50}, keywords = {zinc oxide, thin film, atomic layer deposition, plasma, photocatalysis}, isbn = {978-961-93849-8-5}, title = {Photocatalytic Activity of Thin ALD / PE-ALD ZnO Films: a Comparative Study}, keyword = {zinc oxide, thin film, atomic layer deposition, plasma, photocatalysis}, publisher = {Slovenian Chemical Society}, publisherplace = {Portoro\v{z}, Slovenija} }
@article{article, year = {2020}, pages = {50-50}, keywords = {zinc oxide, thin film, atomic layer deposition, plasma, photocatalysis}, isbn = {978-961-93849-8-5}, title = {Photocatalytic Activity of Thin ALD / PE-ALD ZnO Films: a Comparative Study}, keyword = {zinc oxide, thin film, atomic layer deposition, plasma, photocatalysis}, publisher = {Slovenian Chemical Society}, publisherplace = {Portoro\v{z}, Slovenija} }




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