Naslov
Large enhancement of photocatalytic activity in ZnO thin films grown by plasma-enhanced atomic layer deposition

Autori
Omerzu, Aleš ; Peter, Robert ; Jardas, Daria ; Turel, Iztok ; Salamon, Krešimir ; Podlogar, Matejka ; Vengust, Damjan ; Jelovica Badovinac, Ivana ; Kavre Piltaver, Ivna ; Petravić, Mladen

Izvornik
Surfaces and interfaces (2468-0230) 23 (2021); 100984, 7

Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni

Ključne riječi
zinc oxide ; thin film ; atomic layer deposition ; plasma ; photocatalysis

Sažetak
In this work, we present a large, tenfold enhancement in the photocatalytic activity of thin ZnO films grown by plasma-enhanced atomic layer deposition (PE- ALD) at 100 °C, compared to values obtained for thin ZnO films deposited by a conventional thermal ALD method at the same temperature. Thus, we have demonstrated that we can deposit thin ZnO films using the PE-ALD method both at low temperatures and with a high photocatalytic ability. A number of structural (SEM, EDX, HRTEM, GIXRD, XRR, XPS, SIMS) and optical (UV-Vis, PL) experimental techniques have been employed to elucidate a possible physical origin of the observed remarkable difference in the photocatalytic activity of thin ZnO films grown by the PE-ALD method compared to those grown by the thermal ALD method.

Izvorni jezik
Engleski

Znanstvena područja
Fizika, Kemija, Interdisciplinarne prirodne znanosti

POVEZANOST RADA