Naslov
Application and Development of the LPCVD Process on Ruđer Bošković Institute

Autori
Ivanda, M. ; Furić, K. ; Biljanović, P. ; Musić, S. ; Gotić, M. ; Gamulin, O. ; Gebavi, H. ; Magazin, K.

Vrsta, podvrsta i kategorija rada
Radovi u zbornicima skupova, cjeloviti rad (in extenso), stručni

Izvornik
Proc. MIPRO 2003 / Biljanović, Petar ; Skala, Karolj - Rijeka : Hrvatska udruga za informacijsku i komunikacijsku tehnologiju, elektroniku i mikroelektroniku - MIPRO, 2003, 29-34

Skup
MIPRO 2003 26th International Convention

Mjesto i datum
Opatija, Hrvatska, 19.05.2003. - 23.05.2003

Vrsta sudjelovanja
Predavanje

Vrsta recenzije
Međunarodna recenzija

Ključne riječi
LPCVD; thin film; polysilicon heater; nanosilicon laser

Sažetak
The growth of thin films by Chemical Vapour Deposition is one of the most important techniques for deposition of thin films in modern technology. The reasons of a broad application of the Low Pressure CVD method are in the possibility of deposition of different elements and compounds on relatively low temperatures in amorphous and crystalline phase with high degree of uniformity and purity. A simple handling, high reliability of operations, fast deposition, homogeneity of deposited layers and high reproducibility are the basic characteristics the LPCVD method. With a support of employees of former Factory for Semiconductor RIZ as well as of the Ministry of Science and Technology of Croatia the basis of the microelectronic technology was transferred to Ruđer Bošković Institute, where it was implemented and further developed. Here we will present some basic concepts of the LPCVD method and we will describe its implementation in development of new micro-electronic products - polysilicon thermal heater and nanosilicon laser.

Izvorni jezik
Engleski

Znanstvena područja
Elektrotehnika

POVEZANOST RADA