engleski

Tuning the Properties of Periodic Mesoporous Organosilica Films for Low-k Application by Gemini Surfactants

Periodic mesoporous organosilica (PMO) thin films were synthesized by evaporation‐induced self‐ assembly of 1, 2‐bis(triethoxysilyl)ethane and an ionic Gemini 16‐12‐16 surfactant under acidic conditions. The films were characterized by Fourier‐transform infrared spectroscopy, grazing‐ incidence small‐angle X‐ray scattering, ellipsometric porosimetry, impedance measurements, and nanoindentation. The ease of control of the packing parameter in Gemini surfactants makes the PMO film templated by a Gemini an exciting first step towards small pore size PMO films with engineered mesostructures.

Gemini surfactants ; mesoporous materials ; organosilica ; self-assembly ; thin films

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