engleski

Electrical characterization of a graphite-diamond-graphite junction fabricated by MeV carbon implantation

The Deep Ion Beam Lithography technique has been extensively adopted in recent years for the fabrication of graphitic electrodes in bulk diamond with a wide range of technological applications. Particularly, it has been recently shown that a high current can be driven in devices consisting of micrometer-spaced sub-superficial graphitic electrodes. This effect has been exploited to stimulate electroluminescence from color centers placed in the active region of the device.

Diamond ; Graphite ; Implantation ; Radiation induced effects ; Electrical properties characterization

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