Silicon Nanowires Substrates Fabrication for Ultra-Sensitive Surface Enhanced Raman Spectroscopy Sensors (CROSBI ID 242457)
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Podaci o odgovornosti
Gebavi, Hrvoje ; Mikac, Lara ; Marciuš, Marijan ; Šikić, Mile ; Mohaček-Grošev, Vlasta ; Janči, Tibor ; Vidaček, Sanja ; Hasanspahić, Emina ; Omanović Miklićanin, Enisa ; Ivanda, Mile
engleski
Silicon Nanowires Substrates Fabrication for Ultra-Sensitive Surface Enhanced Raman Spectroscopy Sensors
The silicon based substrates for surface enhanced Raman spectroscopy (SERS) have been synthesized and tested. The silver-assisted electroless wet chemical etching method has been utilized for silicon nanowires production which has been proved as the promising SERS substrate. The morphology of the silicon nanowires coated with silver nanoparticles has been examined by scanning electron microscopy. The SERS measurements tested on rhodamine 6G molecules indicated the optimal silicon nanowire substrate production obtained for 5 M hydrofluoric acid and 30 mM silver nitrate etching solution. The results show SERS detection limit of 10–8 M rhodamine in aqueous solution.
electroless chemical etching ; surface enhanced Raman spectroscopy ; silicon nanowires ; rhodamine
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