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Pregled bibliografske jedinice broj: 883862

Study of ion beam induced chemical effects in silicon with a downsized high resolution X-ray spectrometer for use with focused ion beams


Božičević Mihalić, Iva; Fazinić, Stjepko; Tadić, Tonči; Ćosić, Dalibor; Jakšić, Milko
Study of ion beam induced chemical effects in silicon with a downsized high resolution X-ray spectrometer for use with focused ion beams // Journal of analytical atomic spectrometry, 31 (2016), 2293-2304 doi:10.1039/C6JA00276E (međunarodna recenzija, članak, znanstveni)


Naslov
Study of ion beam induced chemical effects in silicon with a downsized high resolution X-ray spectrometer for use with focused ion beams

Autori
Božičević Mihalić, Iva ; Fazinić, Stjepko ; Tadić, Tonči ; Ćosić, Dalibor ; Jakšić, Milko

Izvornik
Journal of analytical atomic spectrometry (0267-9477) 31 (2016); 2293-2304

Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni

Ključne riječi
High Resolution X-Ray Spectra, PIXE, chemical effects

Sažetak
A downsized wavelength dispersive X-ray spectrometer, employing a flat crystal and a CCD detector for use with focused ion beams has been constructed and employed to study ion beam induced chemical effects in Si K X-ray spectra from silicon and its selected compounds. By using ADP, PET and LiF(110) diffraction crystals, the spectrometer can measure X-rays in the energy range between 1.2 and 8.4 keV, with the energy resolution E/DE(FWHM) 1850 on Al Ka and 1580 on Si Ka achieved with 2 MeV protons. This energy resolution enables the study of secondary effects in the K X-ray spectra of light elements, L-shell spectra of medium Z elements and M-shell spectra from heavy elements. The K X-ray spectra of silicon and selected silicon compounds were measured after excitation with 2 MeV protons and 20 MeV carbon ions focused to micrometer size. The results obtained for peak relative intensities were analyzed to study their dependence on the silicon oxidation states and effective charge on Si. The results were compared with the existing data obtained by proton, electron and photon induced ionization mechanisms, and clear differences between the ionization sources were observed. Si Ka multiple ionization satellites were studied with 20 MeV carbon ions on Si, SiO2 and SiC. The variation of apparent average L vacancy fraction pLx with effective charge on Si was studied. It has been shown that, for ionization by 20 MeV carbon ions, the relative KaL2 intensity is more sensitive to the chemical environment compared to pLx values.

Izvorni jezik
Engleski

Znanstvena područja
Fizika



POVEZANOST RADA


Projekt / tema
HRZZ-IP-2013-11-8127 - Promjene u kristaliničnim materijalima izazvane ionskim snopovima MeV-skih energija (Stjepko Fazinić, )

Ustanove
Institut "Ruđer Bošković", Zagreb

Časopis indeksira:


  • Current Contents Connect (CCC)
  • Web of Science Core Collection (WoSCC)
    • Science Citation Index Expanded (SCI-EXP)
    • SCI-EXP, SSCI i/ili A&HCI
  • Scopus


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