engleski

Magnetron sputtered Ti as a substrate for TiO2 nanotube array preparation by anodization

Large effective surface area and superior electron transport properties are required characteristics for photoanode material in dye sensitised and perovskite solar cells. Nanostructured TiO2 thin films with various shape forms (porous layer, nanoparticles, nanorods, nanotubes) are widely used for that purpose. In this work, we will examine vertically aligned TiO2 nanotube array thin films as possible photoanode material. TiO2 nanotube arrays usually are prepared by anodization of titanium metal foil. TiO2 nanotube arrays structural properties (nanotube diameter, wall thickness) are influenced by anodization parameters (applied voltage, Flour ions concentration in the electrolyte) and surface morphology of starting Ti layer. Instead of thick Ti foil, in this work Ti thin films prepared by DC magnetron sputtering will be used as a substrate for anodization process. SnO and ZnO coated glass will be used as a substrate for magnetron sputtering. Ar working gas pressure and substrate temperature will be varied in order to obtain Ti thin films with different surface morphology. It will be presented and discussed structural properties of starting Ti thin films and TiO2 nanotubes arrays be examined by using simultaneous small and wide angle X-ray scattering under grazing incidence geometry, X-ray reflectivity, scanning electron microscopy and Raman spectroscopy.

TiO2 nanotubes arrays ; Grazing Incidence Small Angle X-ray Scattering ; Grazing Incidence Wide Angle X-ray Scattering ; titanium ; thin films ; magnetron sputtering

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