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Development and applications of silicon nanostructuring


Đerek, Vedran; Mikac, Lara; Gebavi, Hrvoje; Marciuš, Marijan; Ristić, Mira; Głowacki, Eric Daniel; Sariciftci, Niyazi Serdar; Ivanda, Mile
Development and applications of silicon nanostructuring // 16th Joint Vacuum Conference (JVC-16) 14th European Vacuum Conference (EVC-14) 23rd Croatian-Slovenian Vacuum Meeting PROGRAMME AND BOOK OF ABSTRACTS / Kovač, Janez ; Jakša, Gregor (ur.).
Ljubljana: Slovenian Society for Vacuum Technique (DVTS), 2016. (pozvano predavanje, međunarodna recenzija, sažetak, znanstveni)


Naslov
Development and applications of silicon nanostructuring

Autori
Đerek, Vedran ; Mikac, Lara ; Gebavi, Hrvoje ; Marciuš, Marijan ; Ristić, Mira ; Głowacki, Eric Daniel ; Sariciftci, Niyazi Serdar ; Ivanda, Mile

Vrsta, podvrsta i kategorija rada
Sažeci sa skupova, sažetak, znanstveni

Izvornik
16th Joint Vacuum Conference (JVC-16) 14th European Vacuum Conference (EVC-14) 23rd Croatian-Slovenian Vacuum Meeting PROGRAMME AND BOOK OF ABSTRACTS / Kovač, Janez ; Jakša, Gregor - Ljubljana : Slovenian Society for Vacuum Technique (DVTS), 2016

ISBN
978-961-92989-8-5

Skup
16th Joint Vacuum Conference (JVC-16), the 14th European Vacuum Conference (EVC-14) and the 23th Croatian Slovenian International Scientific Meeting on Vacuum Science and Technique

Mjesto i datum
Portorož, Slovenija, 6-10.06.2016.

Vrsta sudjelovanja
Pozvano predavanje

Vrsta recenzije
Međunarodna recenzija

Ključne riječi
Silicon ; nanostructuring ; applications ; sers ; sensors

Sažetak
Silicon nanomaterials, known as one of the most important types of nanomaterials, feature a number of unique merits, such as excellent electronic/mechanical/optical properties, huge surface-to-volume ratios, and facile surface modification [1]. Fast development of silicon nanomaterials with well-defined structures and required functionalities has vastly promoted the advancement of silicon nanotechnology. Structuring surface and bulk of (poly)crystalline silicon on diff erent length scales can signifi cantly alter its properties and improve the performance of opto-electronic devices and sensors based on silicon. Diff erent dominant feature scales are responsible for modifi cation of some of electronic and optical properties of silicon. We present several chemical methods for easy structuring of silicon on nano and micro-scales, based on both electroless and anodic etching of silicon in hydrofl uoric acid based etchants, and chemical anisotropic etching of silicon in basic environments. We show how successive micro and nano structuring creates hierarchical silicon surfaces, which can be used to simultaneously exploit the advantages of both structuring feature length scales. We present some fi nal results of application of silicon nano structuring in development of SERS substrates [2] and silicon/organic heterojunctions for IR light sensing [3]. [1] G.F. Grom, D.J. Lockwood, J.P. McCaff rey, H.J. Labbe, P.M. Fauchet, B. White, J. Diener, D. Kovalev, F. Koch, L. Tsybeskov, Nature 407 (2000) 358 [2] L. Mikac, M. Ivanda, V. Đerek and M. Gotić, J. Raman Spectr. (2016). Doi: 10.1002- jrs.4911 [3] V. Đerek, E. D. Głowacki, M. Sytnyk, W. Heiss, M. Marciuš, M. Ristić, M. Ivanda, and N. S. Sariciftci, Appl. Phys. Lett. 107 (2015) 083302.

Izvorni jezik
Engleski

Znanstvena područja
Fizika, Kemija



POVEZANOST RADA


Projekt / tema
098-0982904-2898 - Fizika i primjena nanostruktura i volumne tvari (Mile Ivanda, )
IP-2014-09-7046

Ustanove
Institut "Ruđer Bošković", Zagreb