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., Novel Direct-Tunneling-Current (DTC) Method for Channel Length Extraction Beyond Sub-50 nm Gate CMOS (CROSBI ID 483158)

Prilog sa skupa u zborniku | izvorni znanstveni rad | međunarodna recenzija

Hong, S. ; Zhang, Y. ; Luo, Y. ; Suligoj, T. ; Kim, S.D. ; Woo, J.C.S. ; Hradsky, B. ; Li, R. ; Min, B.W. ; Vandooren, A. et al. ., Novel Direct-Tunneling-Current (DTC) Method for Channel Length Extraction Beyond Sub-50 nm Gate CMOS // Proceedings of International Electron Devices Meeting IEDM 2001. Institute of Electrical and Electronics Engineers (IEEE), 2001

Podaci o odgovornosti

Hong, S. ; Zhang, Y. ; Luo, Y. ; Suligoj, T. ; Kim, S.D. ; Woo, J.C.S. ; Hradsky, B. ; Li, R. ; Min, B.W. ; Vandooren, A. ; Nguyen, B.Y. ; Wang, K.L.

engleski

., Novel Direct-Tunneling-Current (DTC) Method for Channel Length Extraction Beyond Sub-50 nm Gate CMOS

A novel method for accurate gate length extraction has been developed using direct tunneling current (DTC) through thin gate oxide. Applied to decanano CMOS devices, the proposed method is verified to be free from a severe assumption of unified effective mobility that is one of limitations of conventional method to sub-0.1 *m. The DTC method is also insensitive to doping concentration and gate oxide thinning effect at the corner regions. In addition, we have studied the channel length dependence on gate line-edge roughness by comparing the DTC method and the conventional channel current method. *=micro

gate length extraction; direct tunneling current; short-channel efects

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Podaci o prilogu

2001.

objavljeno

Podaci o matičnoj publikaciji

Proceedings of International Electron Devices Meeting IEDM 2001

Institute of Electrical and Electronics Engineers (IEEE)

Podaci o skupu

International Electron Devices Meeting IEDM 2001

predavanje

02.02.2001-02.02.2001

Sjedinjene Američke Države

Povezanost rada

Elektrotehnika