engleski

Preparation and structure of CU-W thin films

Amorphous thin films of Cu-W alloys have been prepared by a co-deposition sputtering technique in the composition range from Cu75W25 to Cu34W66. The crystallization of Cu50W50 and Cu66W34 amorphous samples started at about 420 K with the appearance of pure Cu. At about 670 K, metastable b.c.c. solid solution W(Cu) appeared and, at 1100 K, this started to decompose and pure W separated. However, the amorphous phase did not completely disappear, even at 1000 K.

amorphous thin films ; magnetron sputtering

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