engleski

Electronic Structure of Two Precursors for Nanofabrication:[(CH3)3CN]2W[N(CH3)2]2 and Ti(NMe2)2(NEt2)2

The electronic structures of bis(tert-butylimino) bis(dimethylamino) tungsten and bis(N-ethylethanaminato)bis(N-methylmethanaminato) titanium heteroleptic complexes, which are precursors for atomic layer deposition of metallic nitride on surfaces, have been investigated by HeI and HeII UV photoelectron spectroscopy and DFT/OVGF calculations. We discuss the electronic structures of these two and other related d0-type complexes in relation to the mechanism of adsorption and decomposition of metal alkylamide precursors on surfaces.

UV photoelectron spectroscopy; W and Ti heteroleptic complexes; atomic layer deposition; electronic structure; DFT-OVGF calculations

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