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izvor podataka: crosbi

Skin barrier integrity and natural moisturizing factor levels after cumulative dermal exposure to alkaline agents in atopic dermatitis (CROSBI ID 198211)

Prilog u časopisu | izvorni znanstveni rad | međunarodna recenzija

Angelova-Fischer, Irena ; Đapić, Irena ; Hoek, Anne-Karin ; Jakaša, Ivone ; Fischer, Tobias W. ; Zillikens, Detief ; Kežić, Sanja Skin barrier integrity and natural moisturizing factor levels after cumulative dermal exposure to alkaline agents in atopic dermatitis // Acta dermato-venereologica, 94 (2014), 6; 640-644. doi: 10.2340/00015555-1815

Podaci o odgovornosti

Angelova-Fischer, Irena ; Đapić, Irena ; Hoek, Anne-Karin ; Jakaša, Ivone ; Fischer, Tobias W. ; Zillikens, Detief ; Kežić, Sanja

engleski

Skin barrier integrity and natural moisturizing factor levels after cumulative dermal exposure to alkaline agents in atopic dermatitis

Dermal exposure to alkaline agents may lead to skin barrier damage and irritant contact dermatitis (ICD). The objective of this study was to investigate the effects of cumulative exposure to 0.5% sodium lauryl sulfate (SLS) and 0.15% sodium hydroxide (NaOH) on the barrier function and natural moisturizing factor (NMF) levels in atopic dermatitis (AD) and healthy volunteers with known filaggrin genotype. The skin response was monitored by measurement of erythema and transepidermal water loss. The stratum corneum NMF levels were determined by HPLC. Repeated exposure to SLS and/or NaOH in AD resulted in more severe impairment of the skin barrier function. Cumulative exposure to the irritants reduced significantly NMF in both the atopic and healthy controls group. The pronounced decrease of NMF after repeated single and sequential irritant exposure may be a pathogenetically relevant factor for development of chronic ICD in both healthy and atopic individuals.

alkaline agents ; atopic dermatitis ; filaggrin mutations ; natural moisturizing factor ; transepidermal water loss ; irritant contact dermatitis

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Podaci o izdanju

94 (6)

2014.

640-644

objavljeno

0001-5555

1651-2057

10.2340/00015555-1815

Povezanost rada

Kemija

Poveznice
Indeksiranost