engleski

Diffusion enhancement in thin films due to low energy ion bombardment during deposition

Sputter deposition of cupper on alumunium, under bombardment of low-energy ions resulted in the formation of two interfacial zones. Results suggest that by supplying energy for the formation of vacancies, the activation energy for diffusion can be reduced.

diffusion; boundary layer effects

Jedan od odabranih radova prezentiranih na Yugoslav-Austrian-Hungarian Fourth Joint Vacuum Conference.