engleski

Controlling Morphological, Orientational and Material Properties of Mesoporous Aluminosilicate Films ; Enabling Supercritical Fluid Deposition of Perpendicularly Ordered Nanowire Arrays

Triblock copolymer templated aluminosilicate mesoporous thin films are formed without loss in long-range order using magic angle spinning nuclear magnetic resonance spectroscopy (MAS-NMR) -optimised selective alkoxide hydrolysis. The judicious incorporation of aluminium into the silica matrix greatly enhances substrate adhesion, chemical resistance, mechanical stability and thermal stability. Compared to silica analogues, the optimised mixed alkoxide mesoporous films demonstrate increases in modulus of hardness (x 4), cohesive strengths (x 2) and resistance to thermal cracking (x 2). No-loss in long-range mesophasic order accruing to heteroatom incorporation is observed. The pore channels in the hexagonal film are unidirectionally aligned and reorientation of the axis is shown through manipulation of preparation and processing conditions. Perpendicularly aligned pores, formed under rapid solvent evaporation conditions on conducting substrates, are used as nanoscale support matrices to host supercritical fluid-deposited semiconductor nanowires. Atomic force microscopy in conducting mode demonstrates continuous electrical contact from mesoporous thin-film surface through aligned nanowires to the conducting substrate

self-assembly; nanowire; triblock copolymer; supercritical fluid

nije evidentirano