The origin of 0.78 eV line of the dislocation related luminescence in silicon (CROSBI ID 188259)
Prilog u časopisu | izvorni znanstveni rad | međunarodna recenzija
Podaci o odgovornosti
Xiang, L. ; Li, D. ; Jin, L. ; Pivac, Branko ; Yang, D.
engleski
The origin of 0.78 eV line of the dislocation related luminescence in silicon
In this paper, the 0.78 eV line of the dislocation related luminescence in the electron-irradiated silicon has been investigated. It is found that the 0.78 eV line only exists in float zone silicon samples, and its intensity could be largely enhanced by high temperature and long time annealing while no 0.78 eV line was found in Czochralski silicon. The activation energy of 0.78 eV line in floating-zone silicon is similar to 13 meV, indicating a different nature from that of D1/D2 lines which can be ascribed to specific reconstructed dislocations which could be easily affected by point defects and temperature.
silicon; dislocations; photoluminescence
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