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Pregled bibliografske jedinice broj: 588727

Analysis of amorphous-nanocrystalline silicon thin films by time-of-flight elastic recoil detection analysis and high-resolution electron microscopy


Gracin, Davor; Siketić, Zdravko; Juraić, Krunoslav; Čeh, Miran
Analysis of amorphous-nanocrystalline silicon thin films by time-of-flight elastic recoil detection analysis and high-resolution electron microscopy // Applied surface science, 275 (2013), 19-22 doi:10.1016/j.apsusc.2013.01.162 (međunarodna recenzija, članak, znanstveni)


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Naslov
Analysis of amorphous-nanocrystalline silicon thin films by time-of-flight elastic recoil detection analysis and high-resolution electron microscopy

Autori
Gracin, Davor ; Siketić, Zdravko ; Juraić, Krunoslav ; Čeh, Miran

Izvornik
Applied surface science (0169-4332) 275 (2013); 19-22

Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni

Ključne riječi
Amorphous-nanocrystalline silicon; TOF-ERDA; Thin films; PECVD

Sažetak
The in-depth distribution of hydrogen atoms in 100 nm thick amorphous-nanocrystalline silicon films (a-nc-Si:H) was estimated by Time-of-Flight Elastic Recoil Detection Analysis (TOF-ERDA) using previously described setup. The layer with nanocrystals were deposited on 50 nm amorphous layer by plasma enhanced chemical vapour deposition, using silane gas highly diluted with hydrogen. As seen by high resolution transmission electron microscopy (HRTEM), the films contained nanocrystals of silicon embedded in amorphous Si: H matrix. The size of crystals and crystal to amorphous fraction increased starting from substrate towards surface of the film. Amorphous matrix looked uniform except in the area close to a-Si:H/a-nc-Si:H interface where spots brighter than average appeared. These areas can be attributed to less density material, presumably voids. It is assumed that the surface of voids is “decorated” with hydrogen that saturates silicon “dangling bonds”. That is why distribution of hydrogen should indicate density fluctuation in material. Consistent with this assumption, TOF- ERDA showed non uniform distribution of hydrogen across the depth with maximum close to a-Si:H/a- nc-Si:H interface that coincidence with less density material seen by HRTEM. This supports the idea about important influence of voids in crystal formation, in particularly in nucleation phase. After heat treatment at 400oC, the distribution of hydrogen remained the same, while total hydrogen concentration decreased. This indicated that the type of hydrogen bonding was the same across the amorphous network and assumed that areas of less density materials consist of agglomerates of smaller voids.

Izvorni jezik
Engleski

Znanstvena područja
Fizika

Napomena
NANOSMAT 2012 ; Jeff Th. M. De Hosson, Nasar Ali, Giuseppe Fierro, Mahmood Aliofkhazraei, Mircea Chipara (ur.).



POVEZANOST RADA


Projekti:
098-0982886-2894 - Tanki filmovi legura silicija na prijelazu iz amorfne u uređenu strukturu (Gracin, Davor, MZOS ) ( POIROT)

Ustanove:
Institut "Ruđer Bošković", Zagreb

Profili:

Avatar Url Zdravko Siketić (autor)

Avatar Url Davor Gracin (autor)

Avatar Url Krunoslav Juraić (autor)

Citiraj ovu publikaciju

Gracin, Davor; Siketić, Zdravko; Juraić, Krunoslav; Čeh, Miran
Analysis of amorphous-nanocrystalline silicon thin films by time-of-flight elastic recoil detection analysis and high-resolution electron microscopy // Applied surface science, 275 (2013), 19-22 doi:10.1016/j.apsusc.2013.01.162 (međunarodna recenzija, članak, znanstveni)
Gracin, D., Siketić, Z., Juraić, K. & Čeh, M. (2013) Analysis of amorphous-nanocrystalline silicon thin films by time-of-flight elastic recoil detection analysis and high-resolution electron microscopy. Applied surface science, 275, 19-22 doi:10.1016/j.apsusc.2013.01.162.
@article{article, year = {2013}, pages = {19-22}, DOI = {10.1016/j.apsusc.2013.01.162}, keywords = {Amorphous-nanocrystalline silicon, TOF-ERDA, Thin films, PECVD}, journal = {Applied surface science}, doi = {10.1016/j.apsusc.2013.01.162}, volume = {275}, issn = {0169-4332}, title = {Analysis of amorphous-nanocrystalline silicon thin films by time-of-flight elastic recoil detection analysis and high-resolution electron microscopy}, keyword = {Amorphous-nanocrystalline silicon, TOF-ERDA, Thin films, PECVD} }
@article{article, year = {2013}, pages = {19-22}, DOI = {10.1016/j.apsusc.2013.01.162}, keywords = {Amorphous-nanocrystalline silicon, TOF-ERDA, Thin films, PECVD}, journal = {Applied surface science}, doi = {10.1016/j.apsusc.2013.01.162}, volume = {275}, issn = {0169-4332}, title = {Analysis of amorphous-nanocrystalline silicon thin films by time-of-flight elastic recoil detection analysis and high-resolution electron microscopy}, keyword = {Amorphous-nanocrystalline silicon, TOF-ERDA, Thin films, PECVD} }

Časopis indeksira:


  • Current Contents Connect (CCC)
  • Web of Science Core Collection (WoSCC)
    • Science Citation Index Expanded (SCI-EXP)
    • SCI-EXP, SSCI i/ili A&HCI
  • Scopus


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