Nanoscale multilayers as optical elements for X-ray photolitography (CROSBI ID 580871)
Prilog sa skupa u zborniku | izvorni znanstveni rad | međunarodna recenzija
Podaci o odgovornosti
Radić, Nikola ; Salamon, Krešimir ; Dubček, Pavo ; Milat, Ognjen ; Jerčinović, Marko ; Dražić, Goran ; Bernstorff, Sigrid
engleski
Nanoscale multilayers as optical elements for X-ray photolitography
The development of ever smaller electronic components by using a photolithographic process is limited by the wavelength of light. For the EUV and X-ray ranges the artificial multilayer coatings in the nanometer range are used as optical elements. From the viewpoint of both technology and optical properties, the tungsten/carbon combination is one of the best for X-ray radiation. In this work we have examined the effects of periodicity, tungsten phase composition, and number of W/C bilayers upon the reflectivity of hard X-rays. The W/C multilayers have been prepared by sequential RF/DC magnetron sputtering and characterized by GISAXS, TEM, and X-ray reflectivity methods.
Gi-SAXS; Hard X ray; Nanoscale multilayers; Photolithographic process; X ray reflectivity
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Podaci o prilogu
27-30.
2011.
objavljeno
Podaci o matičnoj publikaciji
MIPRO 2011 - 34th International Convention on Information and Communication Technology, Electronics and Microelectronics - Proceedings
Ivanda, Mile
Zagreb: Hrvatska udruga za informacijsku i komunikacijsku tehnologiju, elektroniku i mikroelektroniku - MIPRO
978-1-4577-0996-8
Podaci o skupu
MIPRO 2011
predavanje
23.05.2011-27.05.2011
Opatija, Hrvatska