Structural analysis of monolayered and bilayered SnO2 thin films (CROSBI ID 573094)
Prilog sa skupa u zborniku | sažetak izlaganja sa skupa | međunarodna recenzija
Podaci o odgovornosti
Djerdj, Igor ; Gracin, Davor ; Juraić, Krunoslav ; Meljanac, Daniel ; Bogdanović-Radović, Ivančica ; Pletikapić, Galja
engleski
Structural analysis of monolayered and bilayered SnO2 thin films
Mono- and bilayered undoped and fluorine doped SnO2 thin films have been successfully prepared at optimized postdeposition temperatures of 590 and 610 °C by the atmospheric pressure chemical vapor deposition method. The microstructural properties of as-deposited films were thoroughly examined using the Rietveld refinement of powder-like XRD patterns, while the film surface has been probed using atomic field microscopy. The structural parameters were correlated to the deposition parameters and interesting findings were revealed. Finally, the specific electrical resistivity of the thin films has been measured and correlated with the optical transmittance.
transparent conductive oxides; thin film; X-ray diffraction; Rietveld analysis; preferred orientation
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Podaci o prilogu
2011.
objavljeno
Podaci o matičnoj publikaciji
Podaci o skupu
EMRS-2011 Spring Meeting
predavanje
09.05.2011-13.05.2011
Nica, Francuska