engleski

Time resolved spectroscopic characterization of a-C:H deposition by methane and removal by oxygen inductively coupled RF plasma

The deposition of amorphous hydrogenated carbon thin films by inductively coupled radio frequency (IC RF) pure methane plasma and its subsequent removal by IC RF pure oxygen plasma have been studied within a cylindrical glass tube. Both processes were simultaneously monitored by optical emission spectroscopy, light transmission through thin film deposits, temperature of the discharge tube and total gas pressure measurements. Comparing the time evolution of all parameters, various stages of oxygen plasma cleaning process were established. The transitions between E-mode and H-mode of plasma induced by the presence of cleaning products impurities were observed and discussed.

methane plasma; optical emission spectroscopy; amorphous hydrogenated carbon; oxygen plasma cleaning; plasma sterilization

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