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Thermal Stability of Amorphous Silicon-Carbon Alloys Deposited by Magnetron Source (CROSBI ID 160461)

Prilog u časopisu | izvorni znanstveni rad

Gracin, Davor ; Radić, Nikola ; Desnica, U.V. ; Andreić, Željko ; Balzar, D. Thermal Stability of Amorphous Silicon-Carbon Alloys Deposited by Magnetron Source // Fizika A, 4 (1995), 329-335

Podaci o odgovornosti

Gracin, Davor ; Radić, Nikola ; Desnica, U.V. ; Andreić, Željko ; Balzar, D.

engleski

Thermal Stability of Amorphous Silicon-Carbon Alloys Deposited by Magnetron Source

morphous a-Si0.85C0.15:H and a-Si0.6C0.4:H alloys were deposited onto a non-heated substrate using a magnetron source. The samples were exposed to a sequential iso-chronal thermal annealing up to 1000 ° C in a vacuum chamber, and were investigated by the IR spectroscopy and X-ray diffraction measurements. The influence of the thermal treatment on structural ordering was monitored by the evolution of the intensity and shape of the spectral IR lines corresponding to the Si-H and Si-C bonds. At low temperatures, the most pronounced features were accompanied with hydrogen evolution which completes up to 400 ° C. Up to 800 ° C the Si-C absorption lines have gradually changed their shape, peak position and intensity. At 900 ° C, the abrupt changes occured, denoting final transition to crystalline state.

magnetron

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Podaci o izdanju

4

1995.

329-335

objavljeno

1330-0008

1333-9125

Povezanost rada

Fizika

Poveznice