engleski

Optimisation of Ablative Capillary Discharge of PVC with Zinc as Additive

Capillary discharge as a pulsed discharge can be used as a source of extreme ultraviolet (EUV) radiation in new generation of lithographic technology, in extreme ultraviolet lithography (EUVL). It is important to investigate properties and possibilities of optimisation of such radiation source. In this work we describe EUV source based on ablative capillary discharge through the capillary made of polyvinyl chloride (PVC) with zinc (Zn) as additive. It can be seen band radiation at 10 nm and 15.5 nm of wavelength, with FWHMs of about 1 nm and duration of discharge of an order of magnitude of 100 ns. By changing of working parameters, especially of high voltage (from 8 kV to 18 kV) we tried to find optimal working mode. Also, plasma temperature was determined in this type of PVC via Boltzmann plot and comparison with other commercial types of PVCs was done. Comparison of PVC+Zn plasma from ablative capillary discharge with laser produced plasma (LPP) of zinc in EUV region showed that only low concentration of additives in PVC and good thermalization of capillary plasma could produce well-defined bands of radiation.

Ablative capillary discharge; EUV radiation sources; PVC

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