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Band-to-band Tunneling Related Effects in a Thin MOS Structure (CROSBI ID 156925)

Prilog u časopisu | izvorni znanstveni rad | međunarodna recenzija

Vexler, M. I. ; Shulekin, A. F. ; Grgec, Dalibor ; Grekhov, I. V. ; Meinerzhagen, B. Band-to-band Tunneling Related Effects in a Thin MOS Structure // Microelectronic engineering, 72 (2004), 1-4; 180-184

Podaci o odgovornosti

Vexler, M. I. ; Shulekin, A. F. ; Grgec, Dalibor ; Grekhov, I. V. ; Meinerzhagen, B.

engleski

Band-to-band Tunneling Related Effects in a Thin MOS Structure

The effect of band-to-band tunneling (BBT) on the behaviour of MOS structures doped to 10^18-10^19 cm−3 with an 2-3 nm oxide is studied theoretically. The BBT is shown to supply the minority carriers toward the Si/SiO2 interface. This effect can support the inversion layer in the non-equilibrium and modify the I-V and C-V curves. The experimental data on MOS diodes, supporting the theory, are also presented.

tunneling; band-to-band; MOS; inversion layer; C-V curves; I-V curves

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Podaci o izdanju

72 (1-4)

2004.

180-184

objavljeno

0167-9317

Povezanost rada

Elektrotehnika

Indeksiranost