Formation of Ge-nanocrystals in SiO2 matrix by magnetron sputtering and post-deposition thermal treatment (CROSBI ID 763799)
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Podaci o odgovornosti
Desnica, Uroš V. ; Salamon, Krešimir ; Buljan, Maja ; Dubček, Pavo ; Radić, Nikola ; Desnica-Franković, I.D. ; Siketić, Zdravko ; Bogdanović-Radović, Ivančica ; Ivanda, Mile ; Bernstorff, Sigrid
engleski
Formation of Ge-nanocrystals in SiO2 matrix by magnetron sputtering and post-deposition thermal treatment
Ge quantum dots were formed in SiO2 by magnetron sputtering co-deposition, either in a form of thick films or as multilayered films consisiting 20 bilayers.
Ge-nanocrystals ; SiO2 matrix ; magnetron sputtering ; thermal treatment
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Podaci o izdanju
Annual Report 2007, Austrian SAXS Beamline at Elettra
2007.
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