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Low pressure chemical vapor deposition of thin SiOx films in oxygen and nitrogen atmospheres


Vilman, Viktor; Ristić, Davor; Ivanda, Mile; Biljanović, Petar; Gamulin, Ozren; Furić, Krešimir; Ristić, Mira; Musić, Svetozar
Low pressure chemical vapor deposition of thin SiOx films in oxygen and nitrogen atmospheres // Proceedings of 32nd International Convention MIPRO 2009 / Biljanović, Petar ; Skala, Karolj (ur.).
Rijeka: Croatian Society for Information and Communication Technology, Electronics and Microelectronics - MIPRO, 2009. str. 41-45 (predavanje, međunarodna recenzija, cjeloviti rad (in extenso), znanstveni)


Naslov
Low pressure chemical vapor deposition of thin SiOx films in oxygen and nitrogen atmospheres

Autori
Vilman, Viktor ; Ristić, Davor ; Ivanda, Mile ; Biljanović, Petar ; Gamulin, Ozren ; Furić, Krešimir ; Ristić, Mira ; Musić, Svetozar

Vrsta, podvrsta i kategorija rada
Radovi u zbornicima skupova, cjeloviti rad (in extenso), znanstveni

Izvornik
Proceedings of 32nd International Convention MIPRO 2009 / Biljanović, Petar ; Skala, Karolj - Rijeka : Croatian Society for Information and Communication Technology, Electronics and Microelectronics - MIPRO, 2009, 41-45

ISBN
978-953-233-044-1

Skup
32nd International Convention MIPRO 2009

Mjesto i datum
Opatija, Hrvatska, 25-29.05.2009

Vrsta sudjelovanja
Predavanje

Vrsta recenzije
Međunarodna recenzija

Ključne riječi
LPCVD; silicon rich oxide; oxygen atmosphere; nitrogen atmosphere

Sažetak
The silicon rich oxide (SiOx) thin films were prepared in the LPCVD reactor, by thermal oxidation of silane in oxygen atmosphere and in nitrous oxide atmosphere. The stechiometry coefficient x was controlled by the substrate temperature and the ratio of the partial pressures of silane and oxidants O2 and N2O. The structural and optical properties of prepared SiOx films were analyzed by infrared spectroscopy, Raman spectroscopy and scanning electron microscopy.

Izvorni jezik
Engleski

Znanstvena područja
Fizika



POVEZANOST RADA


Projekt / tema
036-0982904-1642 - Sofisticirane poluvodičke strukture za komunikacijsku tehnologiju (Marko Koričić, )
098-0982904-2898 - Fizika i primjena nanostruktura i volumne tvari (Mile Ivanda, )
098-0982904-2952 - Sinteza i mikrostruktura metalnih oksida i oksidnih stakala (Mira Ristić, )

Ustanove
Fakultet elektrotehnike i računarstva, Zagreb,
Institut "Ruđer Bošković", Zagreb