Pretražite po imenu i prezimenu autora, mentora, urednika, prevoditelja

Napredna pretraga

Pregled bibliografske jedinice broj: 397921

Low pressure chemical vapor deposition of thin SiOx films in oxygen and nitrogen atmospheres


Vilman, Viktor; Ristić, Davor; Ivanda, Mile; Biljanović, Petar; Gamulin, Ozren; Furić, Krešimir; Ristić, Mira; Musić, Svetozar
Low pressure chemical vapor deposition of thin SiOx films in oxygen and nitrogen atmospheres // Proceedings of 32nd International Convention MIPRO 2009 / Biljanović, Petar ; Skala, Karolj (ur.).
Rijeka: Croatian Society for Information and Communication Technology, Electronics and Microelectronics - MIPRO, 2009. str. 41-45 (predavanje, međunarodna recenzija, cjeloviti rad (in extenso), znanstveni)


CROSBI ID: 397921 Za ispravke kontaktirajte CROSBI podršku putem web obrasca

Naslov
Low pressure chemical vapor deposition of thin SiOx films in oxygen and nitrogen atmospheres

Autori
Vilman, Viktor ; Ristić, Davor ; Ivanda, Mile ; Biljanović, Petar ; Gamulin, Ozren ; Furić, Krešimir ; Ristić, Mira ; Musić, Svetozar

Vrsta, podvrsta i kategorija rada
Radovi u zbornicima skupova, cjeloviti rad (in extenso), znanstveni

Izvornik
Proceedings of 32nd International Convention MIPRO 2009 / Biljanović, Petar ; Skala, Karolj - Rijeka : Croatian Society for Information and Communication Technology, Electronics and Microelectronics - MIPRO, 2009, 41-45

ISBN
978-953-233-044-1

Skup
32nd International Convention MIPRO 2009

Mjesto i datum
Opatija, Hrvatska, 25-29.05.2009

Vrsta sudjelovanja
Predavanje

Vrsta recenzije
Međunarodna recenzija

Ključne riječi
LPCVD; silicon rich oxide; oxygen atmosphere; nitrogen atmosphere

Sažetak
The silicon rich oxide (SiOx) thin films were prepared in the LPCVD reactor, by thermal oxidation of silane in oxygen atmosphere and in nitrous oxide atmosphere. The stechiometry coefficient x was controlled by the substrate temperature and the ratio of the partial pressures of silane and oxidants O2 and N2O. The structural and optical properties of prepared SiOx films were analyzed by infrared spectroscopy, Raman spectroscopy and scanning electron microscopy.

Izvorni jezik
Engleski

Znanstvena područja
Fizika



POVEZANOST RADA


Projekt / tema
036-0982904-1642 - Sofisticirane poluvodičke strukture za komunikacijsku tehnologiju (Koričić, Marko, MZOS - )
098-0982904-2898 - Fizika i primjena nanostruktura i volumne tvari (Ivanda, Mile, MZOS - )
098-0982904-2952 - Sinteza i mikrostruktura metalnih oksida i oksidnih stakala (Ristić, Mira, MZOS - )

Ustanove
Fakultet elektrotehnike i računarstva, Zagreb,
Institut "Ruđer Bošković", Zagreb

Citiraj ovu publikaciju

Vilman, Viktor; Ristić, Davor; Ivanda, Mile; Biljanović, Petar; Gamulin, Ozren; Furić, Krešimir; Ristić, Mira; Musić, Svetozar
Low pressure chemical vapor deposition of thin SiOx films in oxygen and nitrogen atmospheres // Proceedings of 32nd International Convention MIPRO 2009 / Biljanović, Petar ; Skala, Karolj (ur.).
Rijeka: Croatian Society for Information and Communication Technology, Electronics and Microelectronics - MIPRO, 2009. str. 41-45 (predavanje, međunarodna recenzija, cjeloviti rad (in extenso), znanstveni)
Vilman, V., Ristić, D., Ivanda, M., Biljanović, P., Gamulin, O., Furić, K., Ristić, M. & Musić, S. (2009) Low pressure chemical vapor deposition of thin SiOx films in oxygen and nitrogen atmospheres. U: Biljanović, P. & Skala, K. (ur.)Proceedings of 32nd International Convention MIPRO 2009.
@article{article, year = {2009}, pages = {41-45}, keywords = {LPCVD, silicon rich oxide, oxygen atmosphere, nitrogen atmosphere}, isbn = {978-953-233-044-1}, title = {Low pressure chemical vapor deposition of thin SiOx films in oxygen and nitrogen atmospheres}, keyword = {LPCVD, silicon rich oxide, oxygen atmosphere, nitrogen atmosphere}, publisher = {Croatian Society for Information and Communication Technology, Electronics and Microelectronics - MIPRO}, publisherplace = {Opatija, Hrvatska} }




Contrast
Increase Font
Decrease Font
Dyslexic Font