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Quantitative analysis of a-Si_1-xC_x:H thin films (CROSBI ID 85645)

Prilog u časopisu | izvorni znanstveni rad | međunarodna recenzija

Gracin, Davor ; Jakšić, Milko ; Yang, C. ; Borjanović, Vesna ; Praček, Borut Quantitative analysis of a-Si_1-xC_x:H thin films // Applied surface science, 145 (1999), 188-191. doi: 10.1016/S0169-4332(98)00795-8

Podaci o odgovornosti

Gracin, Davor ; Jakšić, Milko ; Yang, C. ; Borjanović, Vesna ; Praček, Borut

engleski

Quantitative analysis of a-Si_1-xC_x:H thin films

The composition of a-Si_1-xC_x:H films, deposited by magnetron sputtering, was measured by AES (Auger Electron Spectrometry), RBS (Rutherford Backscattering Spectrometry) using both, protons and alpha particles, ERDA (Elastic Recoil Detection Analysis) and FTIR spectrometry. The results obtained by all three methods show agreement in C_c/C_Si ratio within the experimental error. However, the AES somewhat underestimates the silicon concentrations, which is discussed as a consequence of chemical bonding and matrix effects. The hydrogen concentrations obtained by ERDA are typically about 30% higher than those estimated by FTIR, possibly due to the presence of non-bonded hydrogen in the film.

a-Si_1-xC_x:H thin films

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Podaci o izdanju

145

1999.

188-191

objavljeno

0169-4332

10.1016/S0169-4332(98)00795-8

Povezanost rada

Fizika

Poveznice
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