engleski

Nanoporous TiO2 capping layer for transparent conductive electrodes

Titanium dioxide thin films were deposited by PVD arc evaporation from Ti target in an oxygen atmospher onto (a) fluorine doped tin oxide substrate (FTO) and (b) microscopic glass slides. The growth rate was calculated from the film thickness profilometry measurements versus the deposition time. The X-ray photoemission spectroscopy analysis the Ti2p binding energy electron shift, suggested TiO2 stoichiometric compound. The films were highly transparent for the visible light with a transmittance of about 85% for the film of 1 micron thickness. The results for the RMS surface roughness of the films deposited onto FTO substrate (RMS ~ 9 nm) evaluated from the atomic force microscopy (AFM) analysis suggested on nanoporous structures. Regardless of the low conductivity the TiO2 films, their nanoporosity allowed application of a nano TiOx layer as a top capping layer onto FTO films. The sheet resistance of the nano TiO2/FTO double layer was studied as a function of the TiO2 thickness. The layers were exposed to hydrogen plasma and the change in the transmittance and the sheet resistance were discussed.

Titanium dioxide; capping layer; TCO; hydrogen plasma

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