engleski

Microstructural properties of amorphous silicon alloys deposited by dc magnetron source

The a-Si:H, a-Si1-xCx:H and a-Si1-yNy:H alloys were deposited by dc magnetron sputtering and their microstructural properties were estimated as a function of hydrogen (5-30 at%), carbon (x=0-0.4) and nitrogen (y=0-0.3)content. The sample density and void volume distribution in deposited alloys were estimated by IR and NIR spectroscopy. It has been found that the total void volume contribution increases, the void size distribution broadens and its mean value increases as the concentration of eah alloying element increases.

amorphous silicon ; amorphous silicon carbide ; IR spectroscopy ; NIR spectroscopy

Conference: 4th European Vacuum Conference (EVC-4)1st Swedish Vacuum Meeting (SVM-1) Location: UPPSALA, SWEDEN Date: JUN 13-17, 1994