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Pregled bibliografske jedinice broj: 303598

Microstructural properties of amorphous silicon alloys deposited by dc magnetron source


Gracin, Davor; Radić, Nikola; Desnica, Uroš
Microstructural properties of amorphous silicon alloys deposited by dc magnetron source // Vacuum, 46 (1995), 8-10; 943-946 doi:10.1016/0042-207X(95)00078-X (međunarodna recenzija, članak, znanstveni)


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Naslov
Microstructural properties of amorphous silicon alloys deposited by dc magnetron source

Autori
Gracin, Davor ; Radić, Nikola ; Desnica, Uroš

Izvornik
Vacuum (0042-207X) 46 (1995), 8-10; 943-946

Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni

Ključne riječi
amorphous silicon ; amorphous silicon carbide ; IR spectroscopy ; NIR spectroscopy

Sažetak
The a-Si:H, a-Si1-xCx:H and a-Si1-yNy:H alloys were deposited by dc magnetron sputtering and their microstructural properties were estimated as a function of hydrogen (5-30 at%), carbon (x=0-0.4) and nitrogen (y=0-0.3)content. The sample density and void volume distribution in deposited alloys were estimated by IR and NIR spectroscopy. It has been found that the total void volume contribution increases, the void size distribution broadens and its mean value increases as the concentration of eah alloying element increases.

Izvorni jezik
Engleski

Znanstvena područja
Fizika

Napomena
Conference: 4th European Vacuum Conference (EVC-4)1st Swedish Vacuum Meeting (SVM-1) Location: UPPSALA, SWEDEN Date: JUN 13-17, 1994



POVEZANOST RADA


Ustanove:
Institut "Ruđer Bošković", Zagreb

Profili:

Avatar Url Davor Gracin (autor)

Avatar Url Nikola Radić (autor)

Avatar Url Uroš Desnica (autor)

Citiraj ovu publikaciju

Gracin, Davor; Radić, Nikola; Desnica, Uroš
Microstructural properties of amorphous silicon alloys deposited by dc magnetron source // Vacuum, 46 (1995), 8-10; 943-946 doi:10.1016/0042-207X(95)00078-X (međunarodna recenzija, članak, znanstveni)
Gracin, D., Radić, N. & Desnica, U. (1995) Microstructural properties of amorphous silicon alloys deposited by dc magnetron source. Vacuum, 46 (8-10), 943-946 doi:10.1016/0042-207X(95)00078-X.
@article{article, year = {1995}, pages = {943-946}, DOI = {10.1016/0042-207X(95)00078-X}, keywords = {amorphous silicon, amorphous silicon carbide, IR spectroscopy, NIR spectroscopy}, journal = {Vacuum}, doi = {10.1016/0042-207X(95)00078-X}, volume = {46}, number = {8-10}, issn = {0042-207X}, title = {Microstructural properties of amorphous silicon alloys deposited by dc magnetron source}, keyword = {amorphous silicon, amorphous silicon carbide, IR spectroscopy, NIR spectroscopy} }
@article{article, year = {1995}, pages = {943-946}, DOI = {10.1016/0042-207X(95)00078-X}, keywords = {amorphous silicon, amorphous silicon carbide, IR spectroscopy, NIR spectroscopy}, journal = {Vacuum}, doi = {10.1016/0042-207X(95)00078-X}, volume = {46}, number = {8-10}, issn = {0042-207X}, title = {Microstructural properties of amorphous silicon alloys deposited by dc magnetron source}, keyword = {amorphous silicon, amorphous silicon carbide, IR spectroscopy, NIR spectroscopy} }

Časopis indeksira:


  • Current Contents Connect (CCC)
  • Web of Science Core Collection (WoSCC)
    • Science Citation Index Expanded (SCI-EXP)
    • SCI-EXP, SSCI i/ili A&HCI
  • Scopus


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