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Pregled bibliografske jedinice broj: 267584

X-ray reflectivity study of hydrogen implanted silicon


Dubček, Pavo; Pivac, Branko; Bernstorff, Sigrid; Corni, F.; Tonini, R.; Ottaviani, G.
X-ray reflectivity study of hydrogen implanted silicon // Applied Surface Science, 253 (2006), 283-286 (međunarodna recenzija, članak, znanstveni)


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Naslov
X-ray reflectivity study of hydrogen implanted silicon

Autori
Dubček, Pavo ; Pivac, Branko ; Bernstorff, Sigrid ; Corni, F. ; Tonini, R. ; Ottaviani, G.

Izvornik
Applied Surface Science (0169-4332) 253 (2006); 283-286

Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni

Ključne riječi
silicon; hydrogen; ion implantation; X-ray reflectivity

Sažetak
The X-ray Reflectivity (XRR) technique was used to study monocrystalline silicon samples implanted with H2 ions at an energy of 31 keV and to the dose of 2E16 ions/cm2. All samples were subsequently isochronally annealed in vacuum at different temperatures in the range from 100° to 900°C. Although the hydrogen depth distribution was expected to be smooth initially, fringes in the XRR spectra were observed already in the implanted but not annealed sample, revealing the presence of a well defined film like structure. Annealing enhances the film top to bottom interface correlation due to structural relaxation, resulting in the appearance of fringes in the larger angular range, already at low annealing temperatures. The thickness of the film decreases slowly up to 350°C where substantial changes in the roughness are observed, probably due to the onset of larger clusters formation. Further annealing at higher temperatures restores the high correlation of the film interfaces, while the thickness decreases with the temperature more rapidly.

Izvorni jezik
Engleski

Znanstvena područja
Fizika



POVEZANOST RADA


Projekti:
0098020

Ustanove:
Institut "Ruđer Bošković", Zagreb

Profili:

Avatar Url Pavo Dubček (autor)

Avatar Url Ivana Čorni (autor)

Avatar Url Branko Pivac (autor)

Citiraj ovu publikaciju

Dubček, Pavo; Pivac, Branko; Bernstorff, Sigrid; Corni, F.; Tonini, R.; Ottaviani, G.
X-ray reflectivity study of hydrogen implanted silicon // Applied Surface Science, 253 (2006), 283-286 (međunarodna recenzija, članak, znanstveni)
Dubček, P., Pivac, B., Bernstorff, S., Corni, F., Tonini, R. & Ottaviani, G. (2006) X-ray reflectivity study of hydrogen implanted silicon. Applied Surface Science, 253, 283-286.
@article{article, year = {2006}, pages = {283-286}, keywords = {silicon, hydrogen, ion implantation, X-ray reflectivity}, journal = {Applied Surface Science}, volume = {253}, issn = {0169-4332}, title = {X-ray reflectivity study of hydrogen implanted silicon}, keyword = {silicon, hydrogen, ion implantation, X-ray reflectivity} }

Časopis indeksira:


  • Current Contents Connect (CCC)
  • Web of Science Core Collection (WoSCC)
    • Science Citation Index Expanded (SCI-EXP)
    • SCI-EXP, SSCI i/ili A&HCI
  • Scopus





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