engleski

The Resistivity of ZnO coated SnO2 Thin Films to the Hydrogen Plasma

The thin SnO2 films, deposited by APCVD on glass substrates, were coated with ZnO thin films using APCVD. Thickness, doping type and doping level were varied, in order to obtain high conductivity and transparency in the visible part of the spectrum. After deposition, the films were exposed to the RF hydrogen plasma. The main idea is to maintain good optical and electrical properties of SnO2 as TCO but improve its durability against hydrogen plasma. It is shown that hydrogen plasma affects also the ZnO layer although much less than SnO2.

ZnO; SnO2; APCVD; RF hydrogen plasm

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