Comparison of Semiconductor Simulation Models on the Basis of Well-Tempered nMOSFETs (CROSBI ID 517636)
Prilog sa skupa u zborniku | izvorni znanstveni rad | međunarodna recenzija
Podaci o odgovornosti
Grgec, Dalibor
engleski
Comparison of Semiconductor Simulation Models on the Basis of Well-Tempered nMOSFETs
The downscaling of MOS transistors has already reached the nanometer scales, with channel lengths of few tens of nanometers. Due to higher order physical effects, the accuracy of classical numerical device simulation models ; Drift- Diffusion (DD) and Hydrodynamic (HD) is questionable for nanometer scale MOSFETs. Full Band Monte-Carlo (MC) Device Simulation can serve as a physical reference for accessing the HD, DD modeling accuracy by comparing the modeling results. In this paper, a comparison of three consistent simulation models (DD, HD, MC) is presented on the basis of well-tempered bulk-Si nMOSFETs structures.
MOSFET; short channel effect; device simulation model; drift-diffusion; hydrodynamic; Monte-Carlo
nije evidentirano
nije evidentirano
nije evidentirano
nije evidentirano
nije evidentirano
nije evidentirano
Podaci o prilogu
72-75-x.
2006.
objavljeno
Podaci o matičnoj publikaciji
Proceedings of MIPRO 2006
Biljanović, Skala
Rijeka: Hrvatska udruga za informacijsku i komunikacijsku tehnologiju, elektroniku i mikroelektroniku - MIPRO
Podaci o skupu
29^th International Convention - MIPRO 2006
predavanje
22.05.2006-26.05.2006
Opatija, Hrvatska