engleski

Amorphous AlMo thin films prepared by magnetron codeposition

Aluminum corrosion properties are considerably improved when it is alloyed with transition metals. Molybdenum has proven to be one of the most effective additives in that respect. Here we present preparation and characterization of the Al-Mo (10-90 at.%) thin films. Thin films of AlMo alloys have been prepared by codeposition of pure aluminum and pure molybdenum sputtered, respectively, by two independently controlled magnetron sources. A (nominal) alloy composition range was between Al90Mo10 to Al10Mo90. Deposition rate at the substrate (glass, alumina, sapphire, mono-Si) has been 0, 17-0, 35 nm/s, and the final film thickness was about 0, 5 mm. The prepared films have been examined by the RBS, XRD, electrical and micromechanical measurements. A completely amorphous films have been obtained in a composition range Al85Mo15-Al45Mo55 on the substrates at floating potential and at room temperature. The alloys amorphicity was confirmed by a rather high negative temperature coefficient of electric resistivity (up to -13ˇ10-4 K-1) at room temperature, which in some cases increase upon thermal crystallization. The amorphous AlMo alloys are structurally stable up to at least 460oC. The measurements of corrosion resistance of the as-deposited and corresponding thermally crystallized thin films are in progress.

Al-Mo alloys; thin films; magnetron sputtering

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