engleski

Silicon surface irradiated by nitrogen laser radiation

Monocrystalline silicon target was irradiated with a nitrogen laser beam (lambda = 337 nm, maximum energy density 1.1 J/ cm2, pulse duration 6 ns and repetition rate 0.2 Hz). The plasma formed at the silicon surface was observed spectroscopically in air (ne = 3x (10 exp 18) /cm3, Te = 18500K) and in vacuum (ne = 6.5x (10 exp 17) /cm3, Te =16000 K). The irradiated surface in vacuum was studied by a metallographic microscope. Droplets were created at crater edges. Their formation is explained by the hydrodynamical sputtering model.

Laser-material interaction; Silicon; Nitrogen laser radiation; Light microscope observations; Droplets formation; Spectroscopic chracterization of Si-plasma.

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