Sputter-deposited amorphous-like tungsten (CROSBI ID 101682)
Prilog u časopisu | izvorni znanstveni rad | međunarodna recenzija
Podaci o odgovornosti
Radić, Nikola ; Tonejc, Antun ; Ivkov, Jovica ; Dubček, Pavo ; Bernstorff, Sigrid ; Medunić, Zvonko
engleski
Sputter-deposited amorphous-like tungsten
Thin tungsten films were prepared by sputtering of pure tungsten in a cylindrical magnetron device. The XRD-patterns of tungsten films deposited at 3.5 Pa argon pressure regularly exhibited only a very broad signal centered at 2q ť 40° - a distinctive mark of amorphous metals and alloys. The grain size of such amorphous-like tungsten material was estimated to be about 2 nm, while SAXS measurements yield radius of gyration of 1, 4 nm. Its thermal coefficient of the electric resistivity at room temperature was negative - a characteristic feature of amorphous metals and alloys. Thermal stability of the amorphous-like tungsten films was investigated by isochronal heating up to 720°C in vacuum, with continuous monitoring of electric resistivity. The obtained results indicate that amorphous-like tungsten is thermally stable up to 450°C.
magnetron sputtering; tungsten; amorphous phase
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