engleski

Azide-alkyne click reactions in vapor phase processes

Vapor phase processes have been developed for building organic-inorganic hybrid films using small molecules from the gas phase on almost all kind of surfaces. The advantages of these processes include automatization, scalability, uniform coating even of porous substrates and excellent film thickness control at the nanoscale, which make them very interesting for applications, ranging from electronics to biomedical devices. The most known, atomic layer deposition (ALD) is used for the growth of inorganic thin films from organometallic precursors. Similarly, molecular layer deposition (MLD) is used to grow organic polymeric thin films by employing gas organic monomers as precursors, and further combinations of ALD/MLD can afford modular hybrid structures. Although several MLD processes are known today, there is still plenty room for investigation given the vast possibilities provided by the organic chemical reactions. However, the choice of organic precursors is challenging because several factors (e.g., volatility, stability, reactivity) must be considered to expand the scope of the method. Our efforts toward the introduction of azide-alkyne click chemistry in ALD/MLD processes will be presented. This concept has been demonstrated in pulsed vapor phase surface functionalization of metal oxide surfaces (1, 2).

ALD, Alkynes, Azides, Click chemistry

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