engleski

Optical and electrical study of amorphous titanium oxide thin films derived by reactive spark ablation

Developing an easy, low cost method of titanium oxide thin film preparation has been of significant importance in the last decade as they show beneficial functional properties such as good transparency, thermally activated conductivity, wide bandgap and low work function making them suitable for photovoltaic devices, transistors, sensors, etc. [1]. Here we report on the potential use of reactive spark ablation, a novel, low cost and clean method, to produce amorphous titanium oxide thin films suitable for optoelectronic applications by fine tuning the deposition parameters. All of the deposited thin films were characterized at synchrotron X-ray diffraction beamline, also by AFM and SEM which confirmed amorphous structural organisation and meso- nanoporous morphology. XPS spectroscopy was used to determine the Ti:O ratio, while optical bandgap and temperature dependent conductivity were obtained by DRS and electrical measurements using an electrometer.

Spark ablation, nanoparticles, thin films

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