Large enhancement of photocatalytic activity in ZnO thin films grown by plasma-enhanced atomic layer deposition (CROSBI ID 299777)
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Podaci o odgovornosti
Omerzu, Aleš ; Peter, Robert ; Jardas, Daria ; Turel, Iztok ; Salamon, Krešimir ; Podlogar, Matejka ; Vengust, Damjan ; Jelovica Badovinac, Ivana ; Kavre Piltaver, Ivna ; Petravić, Mladen
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Large enhancement of photocatalytic activity in ZnO thin films grown by plasma-enhanced atomic layer deposition
In this work, we present a large, tenfold enhancement in the photocatalytic activity of thin ZnO films grown by plasma-enhanced atomic layer deposition (PE- ALD) at 100 °C, compared to values obtained for thin ZnO films deposited by a conventional thermal ALD method at the same temperature. Thus, we have demonstrated that we can deposit thin ZnO films using the PE-ALD method both at low temperatures and with a high photocatalytic ability. A number of structural (SEM, EDX, HRTEM, GIXRD, XRR, XPS, SIMS) and optical (UV-Vis, PL) experimental techniques have been employed to elucidate a possible physical origin of the observed remarkable difference in the photocatalytic activity of thin ZnO films grown by the PE-ALD method compared to those grown by the thermal ALD method.
zinc oxide ; thin film ; atomic layer deposition ; plasma ; photocatalysis
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Podaci o izdanju
Povezanost rada
Fizika, Interdisciplinarne prirodne znanosti, Kemija