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On the Potential of Lateral BJTs and SiGe HBTs in Advanced CMOS Technologies (CROSBI ID 695302)

Prilog sa skupa u zborniku | izvorni znanstveni rad | međunarodna recenzija

Suligoj, Tomislav ; Žilak, Josip ; Osrečki, Željko ; Koričić, Marko On the Potential of Lateral BJTs and SiGe HBTs in Advanced CMOS Technologies // ECS Transactions / Jeffrey W. Fergus (ur.). The Electrochemical Society (ECS), 2020. str. 111-117 doi: 10.1149/09805.0111ecst

Podaci o odgovornosti

Suligoj, Tomislav ; Žilak, Josip ; Osrečki, Željko ; Koričić, Marko

engleski

On the Potential of Lateral BJTs and SiGe HBTs in Advanced CMOS Technologies

The potential of lateral bipolar transistors, based on Horizontal Current Bipolar Transistor (HCBT), in scaled CMOS technologies are examined by TCAD simulations. Thorough and consistent simulations show that SiGe HCBT can achieve fT/fmax of 358/490 GHz outperforming standard vertical-current HBT with fT/fmax of 348/423 GHz, assuming the same intrinsic transistor doping profile. By optimizing the extrinsic base shape and width, the characteristics of SiGe HCBT can be further improved. SiGe HCBTs in bulk silicon substrates result in better performance comparing to the transistors in SOI substrates.

bipolar transistor ; Horizontal Current Bipolar Transistor (HCBT) ; SiGe ; TCAD

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Podaci o prilogu

111-117.

2020.

objavljeno

10.1149/09805.0111ecst

Podaci o matičnoj publikaciji

ECS Transactions

Jeffrey W. Fergus

The Electrochemical Society (ECS)

Podaci o skupu

238th Meeting of the Electrochemical Society

pozvano predavanje

04.10.2020-09.10.2020

Honolulu (HI), Sjedinjene Američke Države

Povezanost rada

Elektrotehnika

Poveznice