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Minimization of dark counts in PureB SPADs for NUV/VUV/EUV light detection by employing a 2D TCAD-based simulation environment (CROSBI ID 682726)

Prilog sa skupa u zborniku | izvorni znanstveni rad | međunarodna recenzija

Knezevic, Tihomir ; Nanver, Lis K. ; Suligoj, Tomislav Minimization of dark counts in PureB SPADs for NUV/VUV/EUV light detection by employing a 2D TCAD-based simulation environment // Proceedings of SPIE, the International Society for Optical Engineering. 2019. doi: 10.1117/12.2508829

Podaci o odgovornosti

Knezevic, Tihomir ; Nanver, Lis K. ; Suligoj, Tomislav

engleski

Minimization of dark counts in PureB SPADs for NUV/VUV/EUV light detection by employing a 2D TCAD-based simulation environment

PureB single-photon avalanche diodes (SPADs) were investigated with the aid of a newly developed TCAD-based numerical modeling method with which characteristics related to the avalanching behavior can be simulated. The p + region forming the anode of the PureB p + n photodiode is extremely shallow, only a few nanometer deep, which is essential for obtaining a high photon detection efficiency (PDE) for near-, vacuum- and extreme- ultraviolet (NUV/VUV/EUV) light detection but when an implicit guard ring (GR) is implemented, the dark count rate (DCR) can, despite the GR, be deteriorated at the very sharp corners of the p + -region where there is a high concentration of the electric-field. By comparing measurements to simulations, the main mechanism dominating the DCR in the PureB SPADs was identified as band-to-band tunneling (BTBT) while trap-assisted-tunneling also plays a role when the perimeter breakdown is low. Increasing the dose of carriers in the enhancement region negatively impacts the total DCR of the device, but also shifts the origin of the dominant DCR contribution from perimeter to the active region. The simulations for optimization of the SPAD geometry predict that a modification of the n-doped epitaxial region of the PureB SPADs could decrease the DCR by almost two orders of magnitude. This is achieved by increasing the n-epi-layer thickness from 1 μm to 3 μm and lowering the doping from 10 15 cm -3 to 10 14 cm -3. A high electric field at the vertical pn junction in the active region can also be minimized by modifying the implantation parameters of the n-enhancement region thus keeping the BTBT contribution to the DCR sufficiently low.

Avalanche breakdown, Band-to-band tunneling, Detectors, Guard rings, Photodiode, Pure boron, Silicon, Single-photon avalanche diodes (SPADs), Trap-assisted tunneling

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Podaci o prilogu

109120Y

2019.

objavljeno

10.1117/12.2508829

Podaci o matičnoj publikaciji

San Francisco (CA): SPIE

9781510624665

0277-786X

1996-756X

Podaci o skupu

SPIE OPTO: Physics and Simulation of Optoelectronic Devices XXVII

predavanje

02.02.2019-07.02.2019

San Francisco (CA), Sjedinjene Američke Države

Povezanost rada

Elektrotehnika, Fizika, Interdisciplinarne tehničke znanosti

Poveznice