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Pregled bibliografske jedinice broj: 1008959

Beta-TaON thin films: production by reactive magnetron sputtering and the question of non- stoichiometry


Salamon, Krešimir; Mičetić, Maja; Sancho-Parramon, J.; Bogdanović Radović, Ivančica; Siketić, Zdravko; Šarić, Iva; Petravić, Mladen; Bernstorff, S.
beta-TaON thin films: production by reactive magnetron sputtering and the question of non- stoichiometry // Journal of physics. D, Applied physics, 52 (2019), 30; 305304, 12 doi:10.1088/1361-6463/ab1d09 (međunarodna recenzija, pregledni rad, znanstveni)


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Naslov
Beta-TaON thin films: production by reactive magnetron sputtering and the question of non- stoichiometry

Autori
Salamon, Krešimir ; Mičetić, Maja ; Sancho-Parramon, J. ; Bogdanović Radović, Ivančica ; Siketić, Zdravko ; Šarić, Iva ; Petravić, Mladen ; Bernstorff, S.

Izvornik
Journal of physics. D, Applied physics (0022-3727) 52 (2019), 30; 305304, 12

Vrsta, podvrsta i kategorija rada
Radovi u časopisima, pregledni rad, znanstveni

Ključne riječi
Tantalum oxynitride ; reactive magnetron deposition ; growth ; structure ; composition ; stoichiometry

Sažetak
In this work we report on the structure, morphology, composition, chemical bonding and optical properties of tantalum oxynitride (Ta– O–N) thin films prepared by reactive direct current magnetron sputtering. The films have been investigated by grazing incidence x-ray diffraction, x-ray reflectivity, grazing incidence small angle x-ray scattering, time- of-flight elastic recoil detection analysis, x- ray photoelectron spectroscopy and spectroscopic ellipsometry. The composition and the partial pressure of the reactive atmosphere (N2 + O2) have been varied in order to find conditions suitable for the -TaON phase production. As prepared thin films are amorphous and annealing at °C is necessary to promote crystallization. We discuss the role of N2 gas on the kinetics of sputtered particles and its influence on the oxidation rate and porosity of the growing film. The anion composition in Ta–O–N films strongly depends on the reactive gas condition during the deposition. We found that the O/N ratio in - TaON films increases with more N2 or O2 gas in the chamber, whereas the corresponding absorption onset and valence band maximum show a blue shift of up to 0.5 eV. These results were related to the non-stoichiometry in -TaO x N y crystallites with x > y .

Izvorni jezik
Engleski

Znanstvena područja
Fizika

Napomena
University of Rijeka under the project number 18-144



POVEZANOST RADA


Projekt / tema
HHRZZ-IP-2018-01-3633 - HHRZZ-IP-2018-01-3633 (, )
KK.01.1.1.01.0001 - KK.01.1.1.01.0001 (, )
UNI-RI 18-144 - UNI-RI 18-144 (, )

Ustanove
Institut "Ruđer Bošković", Zagreb,
Sveučilište u Rijeci

Citiraj ovu publikaciju

Salamon, Krešimir; Mičetić, Maja; Sancho-Parramon, J.; Bogdanović Radović, Ivančica; Siketić, Zdravko; Šarić, Iva; Petravić, Mladen; Bernstorff, S.
beta-TaON thin films: production by reactive magnetron sputtering and the question of non- stoichiometry // Journal of physics. D, Applied physics, 52 (2019), 30; 305304, 12 doi:10.1088/1361-6463/ab1d09 (međunarodna recenzija, pregledni rad, znanstveni)
Salamon, K., Mičetić, M., Sancho-Parramon, J., Bogdanović Radović, I., Siketić, Z., Šarić, I., Petravić, M. & Bernstorff, S. (2019) beta-TaON thin films: production by reactive magnetron sputtering and the question of non- stoichiometry. Journal of physics. D, Applied physics, 52 (30), 305304, 12 doi:10.1088/1361-6463/ab1d09.
@article{article, year = {2019}, pages = {12}, DOI = {10.1088/1361-6463/ab1d09}, chapter = {305304}, keywords = {Tantalum oxynitride, reactive magnetron deposition, growth, structure, composition, stoichiometry}, journal = {Journal of physics. D, Applied physics}, doi = {10.1088/1361-6463/ab1d09}, volume = {52}, number = {30}, issn = {0022-3727}, title = {beta-TaON thin films: production by reactive magnetron sputtering and the question of non- stoichiometry}, keyword = {Tantalum oxynitride, reactive magnetron deposition, growth, structure, composition, stoichiometry}, chapternumber = {305304} }

Časopis indeksira:


  • Current Contents Connect (CCC)
  • Web of Science Core Collection (WoSCC)
    • Science Citation Index Expanded (SCI-EXP)
    • SCI-EXP, SSCI i/ili A&HCI
  • Scopus


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